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Computational Chemistry Jobs | Postdoc Position @ UGent | Belgium - PhD in the area of reactor engineering, kinetics, and/or computational chemistry | Jobs.

Computational Chemistry Jobs | Postdoc Position @ UGent

Computational Chemistry Jobs | Postdoc Position @ UGent, Belgium: Established in 1817 by King William I of the Netherlands, Ghent University (Dutch: Universiteit Gent, abbreviated as UGent) is a public research university located in Ghent, Belgium. After the Belgian revolution of 1830, the newly-formed Belgian state began to administer the university. In 1930, it became the first Dutch-speaking university in Belgium—French having been the academic language up to that point. In 1991, the university was granted major autonomy and changed its name from State University of Ghent (Dutch: Rijksuniversiteit Gent, abbreviated as RUG) to its current designation. It is one of the larger Flemish universities, consisting of 41,000 students and 9,000 staff members. The current rector is Anne De Paepe (nl).

Ghent consistently rates among the top universities not only in Belgium but also throughout the world. As of 2015, Ghent University ranks 118th globally according to Times Higher Education, 124th according to QS World University Rankings, and 71st according to the Academic Ranking of World Universities.
Postdoc Design of cost-effective precursors for large area Atomic Layer Deposition

Computational Chemistry Jobs | Postdoc Position @ UGent, Belgium

Last application date: Jul 24, 2016 11:55

Department: TW12 – Department of Chemical engineering and technical chemistry

Contract: Limited duration

Degree: Excellent candidates with a PhD the area of reactor engineering, kinetics, and/or computational chemistry is strongly recommended

Occupancy rate: 100%

Vacancy Type: Research staff

Job description

Design of cost-effective precursors for large area Atomic Layer Deposition

Aim: Design of cheap, safe and non-corrosive precursors applicable for large area atomic layer deposition (ALD) processes.

Context:

ALD is a self-limited growth method that is characterized by alternating exposure of the growing film to chemical precursors, resulting in the sequential deposition of (sub)monolayers over the exposed sample surface (see Figure). ALD enables conformal nanocoatings, excellent thickness control, on a variety of substrates ranging from nanostructures used in microelectronics to nanopowders. Since the 90s, ALD research has boomed because of the need for conformal nanocoatings in micro-electronics. Since then, ALD has become a major coating technology and a key manufacturing step in nano-electronics. However, the unique advantages of thickness control and conformality of the ALD technique have inspired investigations into applications outside of the clean room. In recent years, reactor concepts and equipment have become available for large area ALD. Large area ALD involves increased coating speeds, and hence larger precursor consumption. A major bottleneck for commercial application of large area ALD concerns the availability of cheap and safe precursors.

Traditional ALD processes (also called thermal ALD) typically use H2O as reactant, which limits the range of usable precursors. Plasma-enhanced ALD (PE-ALD) allows for a larger variety of precursors, that are less expensive and far easier to handle. Alternatively, other highly reactive reactants such as ozone may be used for this purpose. Typical ALD precursors for deposition of Al2O3, SiO2 and TiO2 are methylaluminium (TMA), bis(diethylamino)silane (BDEAS) and tetrakis(dimethyl-amino)titanium (TDMAT). Alternative precursors that are at least one order of magnitude lower in cost compared to traditional ALD precursors are desired. Important properties of potential alternatives are thermal stability, reactivity for interaction with various substrates, reactivity of adsorbed precursors in conditions of PE-ALD and/or ozone ALD.

Program:

Quantum chemical calculations are used to obtain the relevant properties of a range of potential candidates and to identify promising candidate precursors. In collaboration with other research groups, the experimental behavior of promising candidate precursors in large area ALD will be investigated. These data can then in a next step be used to fine tune the chemical structure allowing to identify safe and cost-effective precursors for large area ALD.

Profile of the candidate (Computational Chemistry Jobs | Postdoc Position @ UGent)

Excellent candidates with a PhD the area of reactor engineering, kinetics, and/or computational chemistry is strongly recommended.

How to apply

Any additional information can be obtained by contacting Guy B. Marin. Any application should enclose a C.V., a one page justification of your interest and the e-mail addresses of at least two references.

Computational Chemistry Jobs | Postdoc Position @ UGent, Belgium

View original notification: http://www.ugent.be/en/work/vacancies/scientific/postdoc-design-of-cost-effective-precursors-for-fgk3t

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